Technology of Semiconductors (TS 1)
The objective of this course is for students to acquire a basic knowledge of the most important technological processes applied to semiconductor materials used primarily in the field of nano- and microelectronics. Furthermore, the main effects that these techno-logical processes have on the optical and electrical properties will be explained as well as their application in optoelectronic devices.
DEVELOPMENT OF THE COURSE AND METHODOLOGY
For the development of the course there will be theory participative classes and discus-sion sessions and resolution practical problems. A collaborative teaching methodology will be used, promoting student-teacher interaction in tutoring and student-student, through discussions.
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TOPIC |
Attendande hours |
|
I.- Introduction to semiconductor materials |
4 |
|
II. Manufacture of semiconductor materials |
2 |
|
III. Epitaxy of semiconductor materials III.1 Liquid Phase Epitaxy technique (LPE) III.2 MOCVD technique III.3 MBE technique |
6 |
|
IV. Doping techniques materials IV.1 Doping by diffusion IV.2 Doping by ion implantation |
4 |
|
V. Thermal Oxidation |
2 |
|
VI. Deposition in stage vapor (CVD) of insulating ma-terials |
2 |
|
VII. Metallization |
2 |
|
VIII. Chemical attacks wet and dry |
2 |
|
IX. Optical lithography and electron beam |
2 |
First exam
The score is divided in several parts:
- First part of the course (exercises) : 10%
- Second part of the course (exercises) : 15%
- Third part of the course (exercises) : 15%
- Written exam including all subjects: 60%
Extraordinary exam
A unique written exam including all subjects.
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